| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1553793 | Superlattices and Microstructures | 2012 | 9 Pages |
Abstract
⺠Nano-masking effect in the SiO2 etching process leaded to surface roughness. ⺠Self-organized nano-particles from etched product increase the surface roughness. ⺠Surface roughness below 1 nm is achieved by decreasing the RF power and pressure. ⺠The pressure and RF power have a direct effect on surface roughness generated by RIE.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Maryam Alsadat Rad, Kamarulazizi Ibrahim, Khairudin Mohamed,