Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1554366 | Superlattices and Microstructures | 2010 | 7 Pages |
Abstract
The authors applied a simple, low-cost, mass-producible contact-transferred and mask-embedded lithography (CMEL) to texture p-GaP window layer for the fabrication of InGaAlP light-emitting diodes (LEDs) emitting at 612 nm. Under 20 mA current injection, it was found that forward voltages were 2.25, 2.24 and 2.25 V for CMEL-400 nm LED, CMEL-2 μm LED and the conventional LED without CMEL, respectively. It was also found that the 20 mA output powers were 1.43, 1.28 and 1.16 mW for CMEL-400 nm LED, CMEL-2 μm LED and the conventional LED without CMEL, respectively.
Keywords
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Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
H.M. Lo, Y.T. Hsieh, S.C. Shei, Y.C. Lee, X.F. Zeng, W.Y. Weng, N.M. Lin, S.J. Chang,