| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1554807 | Superlattices and Microstructures | 2007 | 5 Pages |
Abstract
We present two approaches to achieve a pronounced remanent out-of-plane magnetization in ferromagnetic nanostructures: Ni nanomagnets with high aspect ratios and Fe/Tb multilayer structures with strong interface anisotropy were defined by electron beam lithography and fabricated by electrochemical deposition and UHV evaporation, respectively. Both technologies allow a local spin control in an underlying semiconductor via the magnetic fringe field.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
F. Seifert, G. Buckting, S. Halm, T. Kümmell, G. Bacher, E. Schuster, W. Keune,