Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1555054 | Superlattices and Microstructures | 2008 | 6 Pages |
Abstract
Focused ion-beam milling has been employed to structure magnetic nanoelements from 20Â nm thick films of permalloy (Ni81Fe19). Rectangles are patterned into permalloy thin films grown on Si substrates by means of electron-beam lithography and focused ion-beam (FIB) milling down to 100Â nm dimensions. In this study, we analyse the effect of the FIB milling parameters (ion current, spot size, dose) on the resulting magnetic domain structures. The ion currents have been varied between 10Â pA and 10Â 000Â pA; the dose of the ion beam used for milling was varied in order to achieve the best definition for the milled areas. The resulting edges of the permalloy structures are characterized by means of AFM. We find that a small ion dose does not affect the resulting magnetic domain patterns in the structures, so FIB milling can be applied to create high-quality permalloy nanostructures.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
S. Getlawi, M.R. Koblischka, U. Hartmann, C. Richter, T. Sulzbach,