Article ID Journal Published Year Pages File Type
1555376 Current Opinion in Solid State and Materials Science 2014 7 Pages PDF
Abstract

•Grown epitaxial Bi2Se3 thin films on Al2O3 (0 0 0 1) substrates by PLD via domain matching epitaxy paradigm.•Relatively low repetition rate and low deposition temperature are key elements to achieving Bi2Se3 epitaxial films.•Weak antilocalization and linear magnetoresistance suggest topological surface states in PLD-grown Bi2Se3 films.

We report epitaxial growth via domain matching epitaxy of Bi2Se3 thin films on Al2O3 (0 0 0 1) substrates with over 13% lattice misfit and critical thickness less than one monolayer. X-ray and electron diffraction patterns confirm that the layers are epitaxial with (0 0 0 1) Bi2Se3 || (0 0 0 1) Al2O3 and [21¯1¯0] Bi2Se3 || [21¯1¯0] Al2O3 (or) [21¯1¯0] Bi2Se3 || [112¯0] Al2O3 without the presence of an interfacial pseudomorphic layer. X-ray photoemission spectroscopy reveals that the films are Se-deficient, in agreement with electrical transport data showing n-type carriers and metallic behavior. Magneto-resistance (MR) measurements show a cusp feature corresponding to weak antilocalization and linear-MR shows a non-saturating trend up to 9 T. These results suggest topological surface states in PLD-grown Bi2Se3 films.

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Physical Sciences and Engineering Materials Science Materials Chemistry
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