| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1555516 | Current Opinion in Solid State and Materials Science | 2012 | 11 Pages |
Abstract
⺠Metal assisted chemical etching (MacEtch) is a wet but directional etching method. ⺠Aspect ratio and morphology depend on metal catalyst, semiconductor, and etchants. ⺠Si nanostructures with extremely high aspect ratio can be achieved by MacEtch. ⺠MacEtch also works for non-Si based semiconductors. ⺠MacEtch produced structures are promising for photovoltaic applications.
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Chemistry
Authors
Xiuling Li,