| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1555692 | Current Opinion in Solid State and Materials Science | 2008 | 7 Pages |
Abstract
Ferroelectric thin film has been widely investigated in detail in recent years. The ferroelectric properties of thin films are obviously dependent on the microstructure of the film, which is influenced by some processing parameters for preparing the films, including precursor solution chemistry, nature of substrate, film thickness, and condition of heat treatment etc. In this paper, these processing dependences of the films are reviewed.
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Chemistry
Authors
He Haiyan,