| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1559751 | Computational Materials Science | 2016 | 8 Pages |
Abstract
O atom prefer to occupying N vacancy in CaF2 type UN2, forming a series of U-N-O ternary compounds, which is related with the oxidation resistance of UNxOy layer.254
Keywords
Related Topics
Physical Sciences and Engineering
Engineering
Computational Mechanics
Authors
Xin Wang, Zhong Long, He Huang, Ren Bin, Yin Hu, Lizhu Luo, Ke-Zhao Liu, Peng-Cheng Zhang,