| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1561120 | Computational Materials Science | 2013 | 5 Pages |
Abstract
⺠The diffusion process occurring at the nickel and titanium surfaces is studied by MD simulations. ⺠The diffusion coefficient for Ni and Ti atoms is derived for temperature range 500-700 K. ⺠The value of the diffusion coefficient at room temperature is predicted. ⺠The diffusion of Ni55 cluster on the Ti surface in the presence of water environment is studied. ⺠Cluster's structural rearrangements due to the interaction with titanium surface are described.
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Physical Sciences and Engineering
Engineering
Computational Mechanics
Authors
Alexander V. Yakubovich, Alexey V. Verkhovtsev, Matthias Hanauske, Andrey V. Solov'yov,