Article ID Journal Published Year Pages File Type
1583243 Materials Science and Engineering: A 2008 8 Pages PDF
Abstract

Ti–49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystalline, and were largely parent phase whereas a bulk alloy of the same composition would be expected to be martensite. The stabilisation of the parent phase is proposed to be a grain size effect, with the critical grain size for parent phase stabilisation being about 30 nm.

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Physical Sciences and Engineering Materials Science Materials Science (General)
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