| Article ID | Journal | Published Year | Pages | File Type | 
|---|---|---|---|---|
| 1583441 | Materials Science and Engineering: A | 2007 | 4 Pages | 
Abstract
												The literature data on dissociation widths in elemental semiconductors (Si and Ge) deformed under high-stress conditions are re-examined in the frame of a model which considers that moving dislocations are subjected to a periodic Peierls potential. It is concluded that the experimental results can be interpreted in a consistent way by considering that the mobility of a Shockley partial dislocation depends only on its core structure and not on its leading/trailing position.
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											Authors
												Guy Vanderschaeve, Daniel Caillard, 
											