Article ID Journal Published Year Pages File Type
1583868 Materials Science and Engineering: A 2007 6 Pages PDF
Abstract

Kinetics of molybdenum disilicide (MoSi2) layer transformation into Mo5Si3 one was studied at isothermal annealing of the MoSi2/Mo diffusion couple within the temperature interval 1200–1800 °C. It was revealed that the growth of intermediate silicide layer followed a parabolic law and did not accompanied by formation of the lowest Mo3Si silicide. By analyzing the diffusion problem solid-phase diffusion coefficient of silicon in the Mo5Si3 layer was calculated.

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Physical Sciences and Engineering Materials Science Materials Science (General)
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