Three-dimensional nanomasks using block copolymers confined in the nanopores of anodic aluminum oxide templates

Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.

Graphical abstractThree-dimensional nanomasks using block copolymers have been developed. PS-b-PDMS thin films are coated in the nanopores of anodic aluminum oxide templates via solvent-vapor induced wetting. The patterns of the block copolymers can be transferred to the nanopore walls by etching with a HF solution. The etched template can then be used to fabricate polymer, metal, and inorganic nanostructures with special surface morphologies.Figure optionsDownload full-size imageDownload as PowerPoint slide