| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1589681 | Micron | 2008 | 4 Pages |
Abstract
Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.
Keywords
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Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
T. Genevès, B. Domenichini, L. Imhoff, V. Potin, O. Heintz, P.M. Peterlé, S. Bourgeois,