| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1589734 | Micron | 2009 | 4 Pages |
Abstract
High-resolution Rutherford backscattering spectrometry (HRBS) in combination with grazing angle argon sputtering was carried out to characterize the interface of aluminum–nickel (Al–Ni) alloy and amorphous-silicon films in a thin film transistor (TFT) for liquid crystal display (LCD). After thinning the top Al–Ni layer by a 1-keV Ar sputtering, the sensitivity of the interface oxygen was improved to be twice higher than that before sputtering. The results revealed that the oxygen at the interface relates to the contact characteristics.
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
Chikara Ichihara, Nobuyuki Kawakami, Satoshi Yasuno, Aya Hino, Kazuhisa Fujikawa, Akira Kobayashi, Mototaka Ochi, Hiroshi Gotoh, Toshihiro Kugimiya,