Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1590210 | Micron | 2006 | 4 Pages |
Abstract
Vertically aligned ZnO nanowires were synthesized on the p+ silicon chip by modifying the CVD process with a vapor trapping design. Scanning electron microscopy was used to investigate the morphology of as-obtained nanowires. X-ray diffraction showed that the obtained nanowires were ZnO crystalline. The rectifying characteristics of the p–n heterojunction composed of ZnO nanowires and a p+ silicon chip were observed. The positive turn-on voltage was 0.5 V and the reverse saturation current was 0.01 mA. These vertically aligned ZnO nanowires showed a low field emission threshold of 4 V/μm at a current density of 0.1 μA/cm2. The dependence of emission current density on the electric field followed Fowler–Nordheim relationship.
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Authors
Xiaoyan Xing, Kaibo Zheng, Huahua Xu, Fang Fang, Haoting Shen, Jing Zhang, Jian Zhu, Chunnuan Ye, Guanying Cao, Dalin Sun, Guorong Chen,