Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1590227 | Micron | 2007 | 7 Pages |
Abstract
For complete compensation of aberration, the phase distribution over the mask should be conjugate to that of the phase error of the aberrant wavefront, which necessitates the use of a continuously variable polarization mask. Since such a mask is difficult to implement, we have considered polarizing masks consisting of discrete polarized zones on the lens aperture, leading to polarization phase steps on the exit pupil of the imaging system. The simulation results presented in this paper show that effects of focal shift, partial compensation of primary spherical aberration and astigmatism can indeed be achieved by the proper use of polarization masked apertures.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
D. Roychowdhury, K. Bhattacharya, A.K. Chakraborty,