Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1590803 | Science and Technology of Advanced Materials | 2007 | 4 Pages |
Abstract
A Si wafer and polysilicon deposited on a Si wafer were planarized using catalyst-referred etching (CARE). Two apparatuses were produced for local etching and for planarization. The local etching apparatus was used to planarize polysilicon and the planarization apparatus was used to planarize Si wafers. Platinum and hydrofluoric acid were used as the catalytic plate and the source of reactive species, respectively. The processed surfaces were observed by optical interferometry, atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results indicate that the CARE-processed surface is flat and undamaged.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Akihisa Kubota, Hidekazu Mimura, Kazuto Yamauchi,