Article ID Journal Published Year Pages File Type
1591929 Solid State Communications 2014 4 Pages PDF
Abstract

•Plasma polymerized thin films were grown by the PECVD using the cyclohexane as precursor.•The analysis reveals a highly disordered material.•A transition from a pure Csp3 precursor to a mainly Csp2 layer is observed.•Csp2 structures show a density of defects (with presence of odd rings).

The microstructure and electronic properties of plasma-polymerized thin films grown by the plasma enhanced chemical vapor deposition (PECVD) method using the cyclohexane as precursor gas are investigated as a function of the radiofrequency power. Infrared, Raman and optical transmission measurements, correlated with electron paramagnetic resonance ones, are applied to characterize the films in their as-deposited state. The results indicate that increasing the radiofrequency power induces a decrease of the total bonded hydrogen content, accompanied by an increase of the carbon C-sp2 hybridization proportion. A decrease of the optical gap, with increasing radiofrequency power also occurs, and might suggest an increasing overlapping of the Gaussian π–π* bands around the Fermi level. Simultaneously, an increase of the spin density is observed in the same range of the radiofrequency power, suggesting that most of the spins originate from C-sp2 complexes.

Related Topics
Physical Sciences and Engineering Materials Science Materials Science (General)
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