| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1593049 | Solid State Communications | 2011 | 5 Pages |
Abstract
⺠VUV and IR absorption of Si-OH groups in a- SiO2 are studied in the range T=(4-300)K. ⺠A process of conversion of free into H-bonded Si-OH groups is observed. ⺠Free Si-OH groups only are responsible of the VUV absorption. ⺠Si-OH groups are suggested being arranged in clusters in the a- SiO2 network.
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Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
E. Vella, G. Navarra, R. Boscaino,