| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1594330 | Solid State Communications | 2008 | 6 Pages |
Abstract
We report observations of the Coulomb drag effect between insulating a- Si1âxNbx films. We find that a linear-response transresistivity (Ïd) can only be realized over a limited range of experimental parameters. We observe an anomalous decrease in the single layer resistance and transresistance at low temperatures (T<3K) due to an additional non-linear response coupling, which is in need of further investigation. In this manuscript, we focus on the behaviour at not too low temperatures (3K
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Authors
K. Elsayad, J.P. Carini, D.V. Baxter,