Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1595621 | Solid State Communications | 2007 | 4 Pages |
Abstract
Titanium oxide films grown on Ag(100) have been investigated with low-energy electron diffraction, X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy. As Ti is deposited on Ag(100) at room temperature in an O2 atmosphere at 10â5-10â7Â Torr, a disordered TiO2-like film is formed. As the surface is subsequently heated at 600Â âC, though the composition of the film is nearly unchanged, the film changes into an ordered film with (5Ã1) periodicity [(5Ã1) TiO2 film]. On the other hand, as Ti is deposited in O2 at 5.0Ã10â9-1.0Ã10â8Â Torr, a disordered TiO-like film is formed. As the surface is subsequently heated at 600Â âC, the composition of the film is nearly unchanged and the film changes into an ordered film with (1Ã1) periodicity [(1Ã1) TiO film]. Ultraviolet photoelectron spectroscopy measurements show that the (1Ã1) TiO film has an electronic state around the Fermi level, and the state is ascribed to a partially filled Ti 3d state which has been theoretically expected to exist in a TiO crystal.
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
H. Kaneko, M. Ono, K. Ozawa, K. Edamoto,