Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1600308 | Intermetallics | 2013 | 7 Pages |
Abstract
⺠Phase formation in Mn-Si thin films was investigated during rapid thermal annealing. ⺠Mn4Si7 has been formed at around 485 °C in a very short time (280 s). ⺠Rapid thermal annealing could be very effective for low cost production of Mn4Si7.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
A. Allam, P. Boulet, M.-C. Record,