Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1601202 | Intermetallics | 2010 | 4 Pages |
Abstract
The effectiveness of an arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and γ-TiAl was evaluated by annealing at 1000 °C. The results showed that Cr2O3 acted as an active diffusion barrier by formation of two continuous Al-rich oxide layers at both the TiAl/Cr2O3 and Cr2O3/NiCrAlY interfaces, suppressing the inward diffusion of Ni from NiCrAlY overlay coating to γ-TiAl substrate effectively.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Y.X. Cheng, W. Wang, S.L. Zhu, L. Xin, F.H. Wang,