| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1605644 | Journal of Alloys and Compounds | 2016 | 5 Pages |
Abstract
Na0.5Bi0.5(Ti0.98Mn0.02)O3 (NBTMn) thin films have been fabricated on Pt/Si and LaNiO3 (LNO)/Si substrates. Compared with the NBTMn thin film deposited on Pt/Si substrate which shows poor P-E loops with a round shaped feature because of the high leakage current, the NBTMn thin film on LNO/Si substrate exhibits much improved P-E loops with a slim shaped feature and a remanent polarization of 10.2 μC/cm2.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
C. Feng, C.H. Yang, Y.Y. Zhou, F.J. Geng, P.P. Lv, Q. Yao,