Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
160847 | Chemical Engineering Science | 2006 | 12 Pages |
Abstract
The pulsed plasma process can efficiently reduce the growth of polymerized negative ions and particles, both of which are not good for high-quality thin films. We showed that the high-quality thin films on the particles can be prepared successfully by deposition of low mass chemical precursors by pulsed plasma processes.
Keywords
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Kyo-Seon Kim, Dong-Joo Kim, Qian Qiu Zhao,