| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1612308 | Journal of Alloys and Compounds | 2014 | 5 Pages |
Abstract
The structural and nanomechanical characteristics of ZnO thin films grown on Si(1Â 1Â 1) substrates by using the ALD process are investigated by combining XRD, AFM and Berkovich nanoindentation techniques. Results indicated that the ZnO/Si(1Â 1Â 1) thin films also exhibited clear evidences of fracture behaviors-induced pop-in phenomenon in the load-displacement curve during nanoindentation. Moreover, based on the analysis of the energy release in cracking, the fracture toughness of ALD-derived ZnO thin films deposited on Si(1Â 1Â 1) substrates is calculated.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Sheng-Rui Jian, Ya-Hui Lee,