Article ID Journal Published Year Pages File Type
1612606 Journal of Alloys and Compounds 2014 6 Pages PDF
Abstract

•Interface diffusion with a width of 2–4 nm was detected in Cu–Cr alloy.•Interface mixing is responsible to more rapid increase of electrical resistivity.

Abundant Cu/Cr interface was produced to study the interfacial diffusion at face-centered-cubic/body-centered-cubic interface during heavy cold drawing. Notable interface diffusion with a width of 2–4 nm at Cu/Cr interface was detected. The appearance of the interdiffusion is well explained by the mechanical mixing mechanism with dislocations gliding through the Cu/Cr interface. The greater inelastic scattering of electrons at the interdiffusion zone was responsible to the more rapid increase of electrical resistivity with the increase of drawing strains.

Related Topics
Physical Sciences and Engineering Materials Science Metals and Alloys
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