Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1612606 | Journal of Alloys and Compounds | 2014 | 6 Pages |
Abstract
•Interface diffusion with a width of 2–4 nm was detected in Cu–Cr alloy.•Interface mixing is responsible to more rapid increase of electrical resistivity.
Abundant Cu/Cr interface was produced to study the interfacial diffusion at face-centered-cubic/body-centered-cubic interface during heavy cold drawing. Notable interface diffusion with a width of 2–4 nm at Cu/Cr interface was detected. The appearance of the interdiffusion is well explained by the mechanical mixing mechanism with dislocations gliding through the Cu/Cr interface. The greater inelastic scattering of electrons at the interdiffusion zone was responsible to the more rapid increase of electrical resistivity with the increase of drawing strains.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Jiabin Liu, Lihui Zhang, Lunan Song, Liang Meng, Yuewu Zeng, Miao Wang, Youtong Fang, Jien Ma,