Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1612785 | Journal of Alloys and Compounds | 2014 | 8 Pages |
Abstract
NiO-Ag composite thin films were grown on Corning 7059 glass substrates at 200 °C by DC reactive magnetron sputtering technique. The effect of the oxygen partial pressure on the properties of the deposited films was investigated by X-ray diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), optical and Hall measurements. X-ray diffraction analysis revealed that the deposited films were polycrystalline nature with cubic structure along (2 2 0) and (1 1 1) orientations. X-ray photo electron spectroscopy confirmed the surface presence of Ag ions, indicated that Ag ions were oxidized in the NiO matrix. Morphological studies showed that the grain size and root mean square (RMS) roughness were increased with increasing the oxygen partial pressure. The optical transmittance and band gap values were found to be increased with increasing oxygen partial pressure up to 5 Ã 10â4 mbar, beyond this the values were decreased. The electrical resistivity showed decreasing tendency with increasing the oxygen partial pressure.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Y. Ashok Kumar Reddy, A. Sivasankar Reddy, P. Sreedhara Reddy,