| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1613752 | Journal of Alloys and Compounds | 2013 | 7 Pages |
Abstract
⺠Atomistic transformation processes of Ti films due to N-implantation have been clarified. ⺠The N2+ ions with 62 keV are implanted into as-deposited Ti film in the in-situ TEM. ⺠The hcp-fcc transformation is induced by the shear in the <0 1 · 0> direction on the (<0 0 · 1>) plane. ⺠The shear is promoted by the forming of covalent bonds and by the weakening of Ti-Ti bonds.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Yu Chen, Xiaoyi Feng, Yoshitaka Kasukabe, Shunya Yamamoto, Masahito Yoshikawa, Yutaka Fujino,