Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1616089 | Journal of Alloys and Compounds | 2012 | 6 Pages |
InAs layers were grown with and without bismuth flow by atmospheric pressure metalorganic vapor phase epitaxy on exactly oriented, 2° and 10° misoriented (1 0 0) GaAs substrates. Structural analysis was carried out using high resolution X-ray diffraction. Without bismuth flow, only InAs layers grown on 10° misoriented substrates exhibit a mosaic structure. Layers grown on exactly oriented and 2° misoriented substrates show large full widths at half maxima of their diffraction rocking curves. Growing InAs under bismuth flow leads to the reduction of this full width indicating a clear improvement of their structural quality. Particularly for samples grown on 10° misoriented substrates, a complete disappearance of the mosaic structure was obtained. The crystalline quality improvement is attributed to the contribution of Bi nanodots in relieving strain.
► InAs layers were grown with and without Bi flow by MOVPE on different misoriented GaAs substrates. ► InAs layers grown on 10° misoriented substrates exhibit a mosaic structure. ► Growing InAs under bismuth flow improve the structural quality. ► The crystalline quality improve is attributed to the contribution of Bi nanodots in relieving strain.