Article ID Journal Published Year Pages File Type
1618819 Journal of Alloys and Compounds 2011 6 Pages PDF
Abstract
▶ In order to connect biotechnology and semiconductor fabrication, the two step DWE (dry-wet etching, DWE) of Si nanohollow structure needs a development. Because the DWE is a new material process, its mechanism has still not been examined, and in particular the redox reaction and the effect of sidewalls. The present nanostructures and results have been obtained by an advanced method, and 15-30 nm Ag nano-particles were able to enhance the DWE mechanism in the Ag/Si nanostructures.
Related Topics
Physical Sciences and Engineering Materials Science Metals and Alloys
Authors
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