Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1618819 | Journal of Alloys and Compounds | 2011 | 6 Pages |
Abstract
â¶ In order to connect biotechnology and semiconductor fabrication, the two step DWE (dry-wet etching, DWE) of Si nanohollow structure needs a development. Because the DWE is a new material process, its mechanism has still not been examined, and in particular the redox reaction and the effect of sidewalls. The present nanostructures and results have been obtained by an advanced method, and 15-30Â nm Ag nano-particles were able to enhance the DWE mechanism in the Ag/Si nanostructures.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Zhan-Shuo Hu, Fei-Yi Hung, Shoou-Jinn Chang, Kuan-Jen Chen, Wen-Long Wang, Sheng-Joue Young, Tse-Pu Chen,