| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1618891 | Journal of Alloys and Compounds | 2011 | 9 Pages |
Abstract
⺠The solid-state reactive diffusion between Ni and W was observed at temperatures of 1023-1173 K. ⺠During annealing, the Ni4W layer is formed at the Ni/W interface, and the DIR region is produced at the Ni4W/Ni interface. ⺠The growth behavior of the DIR region was numerically analyzed using the new extended-model. ⺠Within the experimental annealing times, the growth of the DIR region is controlled by the interface reaction and the boundary diffusion.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
S. Inomata, M. Kajihara,