| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1619842 | Journal of Alloys and Compounds | 2010 | 5 Pages |
Abstract
ⶠAll films had an fcc-CrN crystalline structure. ⶠPulsed sputtered CrAlN films showed higher internal stress values, which increased with increasing pulse frequency. ⶠPulsed sputtered CrAlN films showed smaller grain sizes, which decreased with increasing pulse frequency. ⶠThe plastic hardness of the films increased from 16 to 36 GPa when increasing the pulse frequency. Pulsed synthesized CrAlN films showed higher plastic hardness values compared to dc synthesized CrAlN film. ⶠThe microstructure and properties of CrAlN films can strongly vary in the pulsed sputtering condition in balanced magnetron sputtering system.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
S. Khamseh, M. Nose, T. Kawabata, T. Nagae, K. Matsuda, S. Ikeno,