Article ID Journal Published Year Pages File Type
1620949 Journal of Alloys and Compounds 2010 6 Pages PDF
Abstract

α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (Tvap), total chamber pressure (Ptot), laser power (PL) and deposition temperature (Tdep) on the phase, orientation and texture of Al2O3 film were investigated. At Ptot = 0.93 kPa, α-Al2O3 films were obtained in the region of Tvap > 423 K and Tdep > 1100 K. The orientation of α-Al2O3 film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing Ptot. Porous α-Al2O3 films were formed at high Tvap (443 K) and low Ptot (0.47 kPa). At Tvap = 413 K, α-Al2O3 film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing Ptot = 0.93–1.4 kPa, (0 0 6)-oriented α-Al2O3 film with a hexagonal terrace texture was obtained.

Related Topics
Physical Sciences and Engineering Materials Science Metals and Alloys
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