Study of the size effects in the electrical resistivity of ultrathin (<Cu 40 nm) films in the framework of the statistical conduction models

In their pioneering experimental work, Liu et al. have given the data related to the in situ sheet resistance measurements of polycrystalline ultrathin Cu films, where the resistivity ρ, was determined as a function of film thickness d.The aim of this paper is to show that the size effects in polycrystalline ultrathin Cu films can be easily reinterpreted by using a simple analytical expression of the electrical conductivity, earlier proposed in the framework of the multidimensional conduction models. The electronic transport parameters obtained in this study are in good agreement with our previous theoretical works. For this purpose, the study given by the authors which has been interpreted by using the Namba's model is reconsidered.