| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1624988 | Journal of Alloys and Compounds | 2008 | 5 Pages |
Abstract
The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Y.W. Xu, H.M. Wang,