Article ID Journal Published Year Pages File Type
1625239 Journal of Alloys and Compounds 2008 5 Pages PDF
Abstract

2D ordered Si-based pillars were fabricated by nanosphere lithography. Polystyrene nanosphere monolayer was deposited onto the silicon substrate by the self-organization technique, which was used as mask in the following RIE process. The polystyrene nanospheres were thinned by oxygen plasma, and thus the radius of silicon pillars can be controlled.

Related Topics
Physical Sciences and Engineering Materials Science Metals and Alloys
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