Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1625239 | Journal of Alloys and Compounds | 2008 | 5 Pages |
Abstract
2D ordered Si-based pillars were fabricated by nanosphere lithography. Polystyrene nanosphere monolayer was deposited onto the silicon substrate by the self-organization technique, which was used as mask in the following RIE process. The polystyrene nanospheres were thinned by oxygen plasma, and thus the radius of silicon pillars can be controlled.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Y.J. Zhang, W. Li, K.J. Chen,