| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1635263 | Rare Metals | 2006 | 4 Pages |
Abstract
Low resistivity and highly transparent ITO conducting films for solar cell applications were fabricated at low temperature by r.f. magnetron sputtering. ITO films were deposited on glass and silicon substrate. Electrical, optical, structural and morphological properties of the ITO films were investigated in terms of the preparation conditions. The annealing treatment has improved the properties of the ITO films at different degree. The maximum transmittance of the obtained ITO films in the visible range is over 92%, and the low resistivity for the ITO films are about 3.85 à 10â4 Ω.cm at 80 °C, 80 W after annealing.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Bingyan REN, Xiaoping LIU, Minhua WANG, Ying XU,