Fabrication and Raman scattering behavior of novel turbostratic BN thin films

•Novel turbostratic BN thin films have been fabricated on SiO2/Si substrates by a facile chemical vapor deposition method.•The thin film exhibited a novel turbostratic graphite-like structure.•The micro-Raman spectrum of the thin film was found unexpectedly broadened and blue-shifted relative to that of the bulk hexagonal BN.

Novel turbostratic BN thin films have been fabricated via a facile chemical vapor deposition route on SiO2/Si substrates. The BN thin film grew continuously on the entire SiO2/Si surface and the region with uniform thickness (~150 nm) can be up to several centimeters in lateral size which is only limited by the size of the substrate. The thin film exhibited a novel turbostratic graphite-like structure. Moreover, the micro-Raman spectrum of the thin film was found unexpectedly broadened and blue-shifted relative to that of the bulk hexagonal BN. The reason for the peculiar Raman scattering behavior of the turbostratic BN thin films was briefly discussed.