| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1645818 | Materials Letters | 2013 | 5 Pages |
Li-doped NiO thin films (Li:NiO) were deposited on glass substrates using a facile sol–gel method. The effects of Li doping concentration on the structural, electrical and optical properties of Li:NiO films were examined. The structural properties of Li:NiO films were characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy. XRD revealed the Li:NiO films to have a polycrystalline bunsenite structure. The surface morphology of the Li:NiO films exhibited nanocrystalline grains with a randomly oriented morphology. The resistivity decreased substantially to 1.33 k Ω cm at 0.11 mol%, which is one order of magnitude lower than that of the undoped NiO film. The mean transmittance decreased from 70% to 60% with increasing Li doping concentration from 0.02 mol% to 0.19 mol%.
Graphical abstractFigure optionsDownload full-size imageDownload as PowerPoint slideHighlights► A facile, simple and fast hydrothermal method to synthesis high conductivity NiO thin films. ► XRD revealed the Li:NiO films to have a polycrystalline bunsenite structure. ► Li:NiO films with 0.02 mol% Li exhibited the highest mobility (50.55 cm2 V−1 s−1). ► The mean optical transmittance of Li:NiO films was>60%.
