| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1646139 | Materials Letters | 2012 | 4 Pages |
Abstract
Temperature–(water vapor) Pressure‐Sintering (TPS) diagrams were established to control the microstructure evolution and densification during sintering of silicon. Experiments were performed under controlled humidified atmospheres and corroborated diagram predictions.
► Silica layer affects silicon particles sintering. ► The silica layer stability domain was calculated. ► Silicon sintering kinetics was estimated. ► Diagrams are used to control silica stability, microstructure and densification.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J.M. Lebrun, C. Pascal, J.M. Missiaen,