| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1646202 | Materials Letters | 2012 | 4 Pages |
Abstract
Thick polycrystalline CrN coatings (20 μm) were deposited at a high deposition rate (10 μm/h) using a highly ionized plasma generated by modulated pulsed power magnetron sputtering. The microstructure of the thick CrN coating was characterized using transmission electron microscopy. The coating exhibited a super dense microstructure with a grain size in the nanometer range of 100–150 nm. The thick CrN coating showed an average high hardness of 24 GPa, excellent adhesion and wear resistant.
► Thick CrN coatings deposited by the MPPMS technique. ► Extremely dense structure and nanometer scale grains of the thick CrN coatings. ► Good adhesion, toughness and excellent wear resistance of the thick CrN coatings.
Related Topics
Physical Sciences and Engineering
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Nanotechnology
Authors
Jianliang Lin, William D. Sproul, John J. Moore,