| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1646536 | Materials Letters | 2012 | 4 Pages |
Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si3N4 substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure Mn + 1AXn-phase Ti2AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.
► A multilayer system of Ti and AlN was deposited to form the Mn + 1AXn-phase Ti2AlN. ► The single layer thickness was according to the stoichiometrical requirements. ► Subsequent rapid thermal annealing led to the formation of Ti2AlN. ► X-ray diffraction, GDOES and high resolution TEM confirmed the gained phase.
