| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1649913 | Materials Letters | 2009 | 4 Pages |
Abstract
Novel morphology of amorphous/nanocrystalline (nanomorph) silicon has been obtained by plasma enhanced CVD using template porous alumina substrate. The growing heterogeneous Si layer is composed of nanocrystalline and amorphous distinct areas, conformal to the tipped/ribbed alumina template. Raman spectroscopy and XRD data evidence the plasma-assisted preferential growth of nanocrystalline Si bunches forming the honeycomb net and presumably amorphous Si:H areas between them.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A. Khodin, Lee Joong-Kee, Kim Chang-Sam, Kim Sang-Ok,