Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1651306 | Materials Letters | 2007 | 4 Pages |
Abstract
PMN thin films have been investigated as a feasible material for tunable microwave applications. PMN thin films were deposited by RF magnetron sputtering from Pb6MgNb6O22 ceramic target on platinized Si substrates. The crystallinity, thickness, surface morphology, dielectric property, and voltage tunable properties of thin films were investigated by means of X-ray diffraction (XRD), field emission-scanning electron microscopy (FE-SEM), and an impedance analyzer. The influences of sputtering substrate temperature and post-annealing on the tunable dielectric properties of thin films were investigated. Increasing the sputtering substrate temperature and annealing temperature can significantly increase tunability; however, these relations had the limitation that overly annealing temperature degraded the tunability of the thin film. A tunability of 38% at 1100 kV/cm of dc bias field under 1 MHz was achieved for a sample sputtered at 550 °C and annealed at 700 °C.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Sung Hun Yoon, Geun-Kyu Choi, Young P. Hong, Kug Sun Hong, Kyung Hyun Ko,