| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1652019 | Materials Letters | 2007 | 4 Pages |
Abstract
The syntheses and characterization of both tris(diethylamino)aluminum and tris(diisopropylamino)aluminum are presented in this letter. Characterization includes vapor pressure measurements and comparison of the two non-pyrophoric precursors showing them to be viable alternatives to trimethylaluminum. Ultimately, tris(diisopropyl)aluminum was successful in the atomic layer deposition of alumina thin films.
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Authors
Casey R. Wade, Carter Silvernail, Chiranjib Banerjee, Axel Soulet, James McAndrew, John A. Belot,