Layer-by-layer deposition of zirconia thin films from aqueous solutions

Thin films of ZrO2 and Y2O3-doped ZrO2 were deposited using a novel yet simple layer-by-layer technique by means of electrostatic assembling and surface precipitation via dipping substrates alternately in cationic and anionic precursor solutions. Uniform films have been made. A constant growth rate of 5.4 ± 0.3 nm per deposition cycle for the dehydrated nanocrystalline films was achieved. This generic technique can be adapted to make other oxide films and novel multilayers or functionally-graded coatings.