Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1652762 | Materials Letters | 2007 | 4 Pages |
Abstract
High-Tc screen-printed Ho–Ba–Cu–O films were prepared on YSZ substrates by a melt processing method. The films were fired at Ts = 1000–1050 °C for 5 min and cooled to 450 °C by two steps in flowing O2. The maximum critical current density Jc (77 K, 0 T) of 2.0 × 103 A cm− 2 was only attained under much limited firing conditions; Ts = 1020 °C and cooled to 800 °C at a cooling rate of 400 °C h− 1.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Hidemasa Sugimoto, Yumiko Ikebe, Eriko Ban, Yoshiharu Matsuoka,