| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1653082 | Materials Letters | 2007 | 4 Pages |
Abstract
The photoluminescence (PL) properties of ZnO thin films on ITO glass substrate deposited by rf magnetron sputtering with different oxygen partial pressures were studied. It was found that the exciton related emission of ZnO thin films depends on oxygen partial pressure, and that the visible emission related to intrinsic defects has no obvious change with various oxygen partial pressures. Abnormal UV-PL characteristics were observed, and its intensity was obviously enhanced. The emission position has a strong red-shift with increasing excitation intensity, and the emission intensity increases notably with increasing excitation cycle.
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Authors
Xuemei Teng, Hongtao Fan, Shusheng Pan, Cong Ye, Guanghai Li,